发明名称 Lithographic projection apparatus, device manufacturing method, device manufactured thereby and gas composition
摘要 <p>A lithographic projection apparatus which uses one, and optionally also two or more colour interferometric devices to accurately determine the position of a movable table within the apparatus. The apparatus comprises flushing gas means for supplying purge gas to a space accommodating at least a part of said movable table, the purge gas being selected such that leakage of the purge gas into the area of operation of the interferometric devices does not cause significant error in the interferometric measurements. &lt;IMAGE&gt;</p>
申请公布号 EP1172698(A2) 申请公布日期 2002.01.16
申请号 EP20010305863 申请日期 2001.07.06
申请人 ASML NETHERLANDS B.V. 发明人 PRIL, WOUTER ONNO;HENSHAW, PHILIP DENNIS;VAN DE PASCH, ENGELBERTUS ANTONIUS FRANCISCUS;BEEMS, MARCEL HENDRIKUS MARIA
分类号 C01B21/04;C01B23/00;G03F7/20;(IPC1-7):G03F7/20 主分类号 C01B21/04
代理机构 代理人
主权项
地址