CHROMIUM ETCHING COMPOSITION

摘要

PURPOSE: A chromium etching composition is provided to simplify etching operations for liquid crystalline display element gate or source/drain wiring thereof. CONSTITUTION: The chromium etching composition comprises 8-12wt.% ceric ammonium nitrate, 9-13wt.% perchloric acid, 0.9-1.1wt.% formic acid, the balance of water. The method for liquid crystalline display element gate or source/drain comprises photolithography of a gate electrode wiring; ashing the gate electrode wiring with oxygen; etching the aluminium of the ashed gate electrode wiring; strip of photoresist of the aluminium-ashed gate electrode wiring; etching chromium of the photoresist-stripped gate electrode wiring with the chromium etching composition of the present invention.