METHOD OF CLEANING POLISHING PAD PREVENTING MICRO SCRATCH

摘要

PURPOSE: A method of cleaning a polishing pad preventing a micro scratch is provided to prevent a micro scratch from particles of slurry formed on a center portion of a polishing pad by injecting uniformly deionized water on the center portion of the polishing pad. CONSTITUTION: A discharge operation of a slurry discharged in a polishing process is stopped(S201). Deionized water is injected from a nozzle to a center portion of a polishing pad(S202). The deionized water is injected uniformly to the surface of the rotating polishing pad and a head assembly. The polishing pad is cleaned by injecting uniformly the deionized water. The number of the nozzle is one or more. A slurry is removed from a surface of the polishing pad by using a rotary force of the polishing pad(S203). The injection operation of the deionized water is stopped from the nozzle(S204).