发明名称 CHEMICAL SUPPLY APPARATUS OF SEMICONDUCTOR FABRICATING EQUIPMENT
摘要 PURPOSE: A chemical supply apparatus of semiconductor fabricating equipment is provided to detect air bubbles generated from an end portion of a nozzle or chemicals solidified on the end portion of the nozzle by using a sensor. CONSTITUTION: A stage(60) is used for loading a substrate(W). A nozzle(56) is used for supplying chemicals to the substrate(W). A pump(52) is used for pumping the chemicals. A chemical supply line(54) is used for connecting the pump(52) with the nozzle(56). The first identification portion(62) is used for detecting air bubbles generated from the chemicals. The first identification portion(62) is formed with the first sensor(62a) and the first alarm portion(62b). A generator(58) is connected with the nozzle(56) in order to absorb the chemicals from an end portion of the nozzle(56). The second identification portion(64) is used for detecting the remaining chemicals of the end portion of the nozzle(56). The second identification portion(64) is formed with the second sensor(64a) and the second alarm portion(64b).
申请公布号 KR20020004132(A) 申请公布日期 2002.01.16
申请号 KR20000037648 申请日期 2000.07.03
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, YONG SU
分类号 H01L21/30;(IPC1-7):H01L21/30 主分类号 H01L21/30
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