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发明名称
REACTOR AND PROCESS FOR COATING FLAT SUBSTRATES
摘要
申请公布号
EP0763148(B1)
申请公布日期
2002.01.16
申请号
EP19950924157
申请日期
1995.06.26
申请人
AIXTRON GMBH
发明人
JUERGENSEN, HOLGER;BACHEM, KARL HEINZ, DR.
分类号
C23C16/455;C23C16/44;C23C16/458;(IPC1-7):C23C16/44;C23C16/30;C23C16/54
主分类号
C23C16/455
代理机构
代理人
主权项
地址
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