| 摘要 |
PURPOSE: A deposition apparatus for polymerization is provided to obtain uniformity of a sample passing a deposition chamber by distributing uniformly a reaction gas in the deposition chamber with plasma. CONSTITUTION: The first electrode and the second electrode face each other. The first and the second electrodes are used for generating plasma. A deposition chamber(50) is used for forming a thin film on a sample(M) by using the plasma. A gas injection portion is used for supplying uniformly a reaction gas into an inside of a deposition chamber(50). The gas injection portion is formed with an upper gas injection nozzle(51) and a lower gas injection nozzle(53). A plurality of mesh structures(55,57) is formed on an upper side of a lower side of the deposition chamber(50) in order to pass, mix, and distribute the reaction gas. The plural mesh structures(55,57) are formed with a plurality of mesh members(56,58). A plurality of slits(59) is formed on both sides of the mesh members(56,58).
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