发明名称 THERMOSENSIBLE PLATE MATERIAL FOR FORMING LITHOGRAPHY AND METHOD FOR PREPARING THE SAME, LIQUID THERMOSENSIBLE PLATE MATERIAL FOR FORMING LITHOGRAPHY, AND LITHOGRAPHY
摘要 <p>A heat sensitive type plate material for forming lithography comprising a substrate (1) and, formed thereon, a heat sensitive layer (2), which in turn comprises a hydrophilic polymer (3) having a Lewis base moiety, lipophilic part forming particles (4) which form a lipophilic part on the surface of a plate through the change caused by heat, and polyvalent metal oxide particles (5), the lipophilic part forming particles (4) and the polyvalent metal oxide particles (5) being dispersed homogeneously in the heat sensitive layer (2). The plate material requires no developing process on forming a plate, and can form a lithography which has not only high mechanical strength, but also high printing durability, and further can be prepared with no significant increase of production cost. <IMAGE></p>
申请公布号 EP1172229(A1) 申请公布日期 2002.01.16
申请号 EP20000917315 申请日期 2000.04.14
申请人 FUJI PHOTO FILM CO., LTD. 发明人 IDE, YOUICHIROH;SHIRATAKI, HIRONOBU;TOMEBA, KEI;SUZUKI, TARO
分类号 B41C1/10;B41N1/14;(IPC1-7):B41N1/14 主分类号 B41C1/10
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