发明名称 METHOD OF AND DEVICE FOR PRODUCING SILICON CARBIDE SINGLE CRYSTAL, AND SILICON CARBIDE SINGLE CRYSTAL
摘要 PROBLEM TO BE SOLVED: To solve the problems that during the growth of a silicon carbide single crystal, many crystal defects known as micropipes occur near the boundary between the single crystal and polycrystal, a strain occurs in the single crystal and further, a penetration hole-like micropipe parallel to the growth direction of silicon carbide single crystal occurs in the crystal by the deposition of polycrystal around the single crystal. SOLUTION: A seed crystal is held on a substrate disposed so as to set a space between it and the inner wall of a crucible in the low temperature portion inside the crucible.
申请公布号 JP2002012500(A) 申请公布日期 2002.01.15
申请号 JP20000186649 申请日期 2000.06.21
申请人 SHOWA DENKO KK 发明人 SHIGETO MASASHI;NAGATO NOBUYUKI;YANO KOTARO;SAKAGUCHI YASUYUKI
分类号 C30B29/36;(IPC1-7):C30B29/36 主分类号 C30B29/36
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