发明名称 |
METHOD OF AND DEVICE FOR PRODUCING SILICON CARBIDE SINGLE CRYSTAL, AND SILICON CARBIDE SINGLE CRYSTAL |
摘要 |
PROBLEM TO BE SOLVED: To solve the problems that during the growth of a silicon carbide single crystal, many crystal defects known as micropipes occur near the boundary between the single crystal and polycrystal, a strain occurs in the single crystal and further, a penetration hole-like micropipe parallel to the growth direction of silicon carbide single crystal occurs in the crystal by the deposition of polycrystal around the single crystal. SOLUTION: A seed crystal is held on a substrate disposed so as to set a space between it and the inner wall of a crucible in the low temperature portion inside the crucible.
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申请公布号 |
JP2002012500(A) |
申请公布日期 |
2002.01.15 |
申请号 |
JP20000186649 |
申请日期 |
2000.06.21 |
申请人 |
SHOWA DENKO KK |
发明人 |
SHIGETO MASASHI;NAGATO NOBUYUKI;YANO KOTARO;SAKAGUCHI YASUYUKI |
分类号 |
C30B29/36;(IPC1-7):C30B29/36 |
主分类号 |
C30B29/36 |
代理机构 |
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代理人 |
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地址 |
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