| 摘要 |
PROBLEM TO BE SOLVED: To provide quartz glass for UV ray and a method of manufacturing the same which is small in deterioration of transmittance caused by irradiation with excimer laser beam and whose variance width of refractive indexΔn is small. SOLUTION: The optical synthetic quartz glass is characterized in that the OH group concentration is 100 ppm or less, F concentration is 1000 ppm or less, and the variance width of refractive indexΔn is 5×10-7 or less. The method of manufacturing the same is characterized in that a transparentizing treatment of a porous body of synthetic quartz glass, and a heat treatment in at least one kind of atmosphere among inert elements He, Ne, Ar, Kr, and Xe, under a pressure of 30-1000 Pa, at a temperature of 1000-1500 deg.C for 1-20 hours.
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