发明名称 Semiconductor device
摘要 A semiconductor device which is provided with enhanced reliability and capable of preventing cracking of a layer below an interconnection layer and separation of the interconnection layer and a bonding pad electrode layer. The semiconductor device includes: an interconnection layer including a conductive material formed on a silicon substrate; an intermediate layer formed in contact with interconnection layer and including a titanium layer and a titanium nitride layer; and a bonding pad electrode layer which is in contact with the intermediate layer.
申请公布号 US6339257(B1) 申请公布日期 2002.01.15
申请号 US19990352338 申请日期 1999.07.13
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 FUJIKI NORIAKI;YAMASHITA TAKASHI;HARADA SHIGERU;MIKI KAZUNOBU
分类号 H01L21/60;H01L23/485;(IPC1-7):H01L23/48 主分类号 H01L21/60
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