| 摘要 |
PURPOSE: A clean room for fabricating a semiconductor is provided to control constantly the amount of air current supplied to a clean room. CONSTITUTION: A hepa filter(28) is installed on each upper side of a service area(22) for installing a semiconductor fabricating device, a process area(24) for performing a fabricating process, and a space area(26). A grating(30) is installed on a bottom portion of a clean room facing the hepa filter(28). Air is cleaned by the hepa filter(28) installed on the service area(22), the process area(24), and the space area(26). The cleaned air is supplied to an inside of the clean room. The cleaned air is discharged to the grating(30). A cleanness ratio of the clean room is controlled by air current due to the hepa filter(28) and the grating(30). A port(36) is installed to one side of the semiconductor fabricating device. An exhaust hole(32) is installed at a back side of the semiconductor fabricating device.
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