| 发明名称 |
Low resistivity tantalum |
| 摘要 |
An alpha-phase tantalum having a resistivity of about 15 micro-ohm-cm or less is provided and is especially useful as a barrier layer for copper and copper alloy interconnections.
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| 申请公布号 |
US6339258(B1) |
申请公布日期 |
2002.01.15 |
| 申请号 |
US19990347221 |
申请日期 |
1999.07.02 |
| 申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
COONEY, III EDWARD CRANDAL;UZOH CYPRIAN EMEKA |
| 分类号 |
H01L23/532;(IPC1-7):H01L23/48;H01L23/52 |
主分类号 |
H01L23/532 |
| 代理机构 |
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