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发明名称
METHOD FOR FORMING A T-GATE FOR BETTER SALICIDATION
摘要
申请公布号
SG85702(A1)
申请公布日期
2002.01.15
申请号
SG20000001843
申请日期
2000.03.30
申请人
CHARTERED SEMICONDUCTOR MANUFACTURING LTD
发明人
CHIVUKULA SUBRAHMANYAM;YELEHANKA RAMACHANDRAMURTHY PRADEEP;RAMAKRISHNAN RAJAGOPAL
分类号
H01L21/336;H01L29/423;H01L29/78;(IPC1-7):H01L21/336
主分类号
H01L21/336
代理机构
代理人
主权项
地址
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