APPARATUS AND METHOD FOR FORMING DEPOSITION FILM, VACUUM APPARATUS, LEAK EVALUATION METHOD AND PROGRAM FOR EVALUATING LEAK

摘要

PROBLEM TO BE SOLVED: To provide an apparatus and a method for forming a deposition film by using a spontaneously flammable gas, which can quickly detect a leak when the air is intruded into a chamber due to an unexpected accident such as a failure of a pipe. SOLUTION: The apparatus or a method for forming a deposition film on a base substance in the chamber, by means of supplying a source gas to the chamber and imposing a high-frequency power, while exhausting inside of the chamber which can be made vacuum through an exhaust pipe connected to an exhausting means, is characterized by having a sensor for detecting the leak according to a reaction heat of the source gas supplied into the chamber with oxygen in the air contaminated from the outside, and for stopping the feed of the above source gas.