发明名称 FAR-INFRARED-RAY RADIATION MATERIAL AND MANUFACTURING METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To improve the heat-resistant strength and the heat-resistant emissivity of a far infrared ray radiation material. SOLUTION: An aluminum layer containing 3-12 wt.% silicon and having a thickness of 5-200μm is coated on a base material 11 to produce a composite material 11. The composite material 11 is heated at 500-900 deg.C to form an alloyed layer 12 of aluminum and iron and an aluminum oxide layer 13 on the composite material 11. The aluminum oxide layer 13 is to contain 3-12 wt.% silicon.
申请公布号 JP2002012963(A) 申请公布日期 2002.01.15
申请号 JP20000197029 申请日期 2000.06.29
申请人 FUJIKURA LTD 发明人 MAEJIMA SEIJU;SARUWATARI KOICHI;HIRATA MASANORI;BABA NORIYASU;TERAMOTO KEIGO
分类号 H05B3/10;C23C2/12;C23C2/28;C23C8/62;(IPC1-7):C23C8/62 主分类号 H05B3/10
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