发明名称 |
RADIATION SOURCE, LITHOGRAPHIC APPARATUS, MANUFACTURING METHOD OF DEVICE, AND DEVICE MANUFACTURED BY THE SAME |
摘要 |
PURPOSE: A radiation source is provided to have an effective self-initiation that allows making use of the dynamical pinch effect to create a high-temperature, high-density plasma for an enhanced conversion efficiency of electrical energy into radiation. CONSTITUTION: A radiation source includes an anode and a cathode for creating a discharge in a vapor in a space between anode and cathode and to form a plasma of a working vapor to generate electromagnetic radiation. The cathode defines a hollow cavity in communication with the discharge region through an aperture that has a substantially annular configuration around a central axis of the radiation source to initiate the discharge. A driver vapor is supplied to the cathode cavity and the working vapor is supplied in a region around the central axis in between anode and cathode.
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申请公布号 |
KR20020003292(A) |
申请公布日期 |
2002.01.12 |
申请号 |
KR20010038232 |
申请日期 |
2001.06.29 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BIJKERK FREDERIK;IVANOV VLADIMIR VITAL EVITCH;KOROP EVGENII DMITREEVITCH;KOSHELEV KONSTANTIN NIKOLAEVIT;ZUKAVISHVILI GIVI GEORGIEVITCH |
分类号 |
G21K5/02;G03F7/20;H01L21/027;H05G2/00;H05H1/24;(IPC1-7):H01L21/027 |
主分类号 |
G21K5/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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