发明名称 RADIATION SOURCE, LITHOGRAPHIC APPARATUS, MANUFACTURING METHOD OF DEVICE, AND DEVICE MANUFACTURED BY THE SAME
摘要 PURPOSE: A radiation source is provided to have an effective self-initiation that allows making use of the dynamical pinch effect to create a high-temperature, high-density plasma for an enhanced conversion efficiency of electrical energy into radiation. CONSTITUTION: A radiation source includes an anode and a cathode for creating a discharge in a vapor in a space between anode and cathode and to form a plasma of a working vapor to generate electromagnetic radiation. The cathode defines a hollow cavity in communication with the discharge region through an aperture that has a substantially annular configuration around a central axis of the radiation source to initiate the discharge. A driver vapor is supplied to the cathode cavity and the working vapor is supplied in a region around the central axis in between anode and cathode.
申请公布号 KR20020003292(A) 申请公布日期 2002.01.12
申请号 KR20010038232 申请日期 2001.06.29
申请人 ASML NETHERLANDS B.V. 发明人 BIJKERK FREDERIK;IVANOV VLADIMIR VITAL EVITCH;KOROP EVGENII DMITREEVITCH;KOSHELEV KONSTANTIN NIKOLAEVIT;ZUKAVISHVILI GIVI GEORGIEVITCH
分类号 G21K5/02;G03F7/20;H01L21/027;H05G2/00;H05H1/24;(IPC1-7):H01L21/027 主分类号 G21K5/02
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