发明名称 METHOD FOR FORMING ALIGNMENT LAYER
摘要 PURPOSE: A method for forming an alignment layer is provided to easily form an alignment layer at a low cost and to reduce the potential impurities on the surface of an alignment layer due to extraneous debris. CONSTITUTION: A film(an aligned atomic structure) is adhered and aligned on a substrate(11). The method comprises a step to deposit the film on the substrate by shooting an ion-beam(4) at the substrate with a specified incident angle and simultaneously and adhering the film to the substrate and another step to align an atomic structure of the film in at least a specified aligning direction.
申请公布号 KR20020003280(A) 申请公布日期 2002.01.12
申请号 KR20010033776 申请日期 2001.06.15
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CALLEGARI ALEXANDRO;GALLIGAN EILEEN ANN;JAMES ANDREW LACEY;JAMES PATRICK DOYLE;KATO YOSHIMINE;MINHA RUU;NAKANO HIROKI;PURAVIIN CHOOD HARRY;SHUI CHIN ALAN RYAN
分类号 G02F1/1333;C23C14/06;C23C14/22;C23C14/34;G02F1/1337;(IPC1-7):G02F1/133 主分类号 G02F1/1333
代理机构 代理人
主权项
地址