发明名称 |
METHOD FOR FORMING ALIGNMENT LAYER |
摘要 |
PURPOSE: A method for forming an alignment layer is provided to easily form an alignment layer at a low cost and to reduce the potential impurities on the surface of an alignment layer due to extraneous debris. CONSTITUTION: A film(an aligned atomic structure) is adhered and aligned on a substrate(11). The method comprises a step to deposit the film on the substrate by shooting an ion-beam(4) at the substrate with a specified incident angle and simultaneously and adhering the film to the substrate and another step to align an atomic structure of the film in at least a specified aligning direction. |
申请公布号 |
KR20020003280(A) |
申请公布日期 |
2002.01.12 |
申请号 |
KR20010033776 |
申请日期 |
2001.06.15 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CALLEGARI ALEXANDRO;GALLIGAN EILEEN ANN;JAMES ANDREW LACEY;JAMES PATRICK DOYLE;KATO YOSHIMINE;MINHA RUU;NAKANO HIROKI;PURAVIIN CHOOD HARRY;SHUI CHIN ALAN RYAN |
分类号 |
G02F1/1333;C23C14/06;C23C14/22;C23C14/34;G02F1/1337;(IPC1-7):G02F1/133 |
主分类号 |
G02F1/1333 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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