| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a purging means, which is effective for reducing the effects of vibration or of deviations caused by the movement of a stage on a wafer and/or the proximity of a reticle which moves in an ultraviolet-ray path, in an aligner using ultraviolet rays. SOLUTION: A moving system comprises a reference structure 4, having a guide face 6, a movable section 3 which is movable along the guide face, and actuator 8, consisting of a movable member 2 installed on the movable section side and stators 1, 1' which are movable along the guide face, the stators moving on the guide face due to the reaction force generated by driving the movable section. In a stage provided with the moving system, the stator and the movable member of a linear motor has an open structure rather than a telescopic structure, and on the inside of the stator, a shielding wall is installed so as to wrap the movable section including the movable member, on the end face from an illumination optical system and/or projection optical system to the reference structure, to purge the inside by an inert gas.</p> |
