| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus for conveying a semiconductor wafer, that has the handling mechanism capable of reducing particle generation concerned when having such as construction that a wafer supporting part made of silicon is used, in a processor such as SIMOX ion implantation equipment. SOLUTION: This apparatus is constructed so as to transfer the wafer that is made to fundamentally stand straight as it is, and positions for the wafer of supporting pins that are horizontally disposed are arranged so as to be different for the feed side and a reception side. For example, when the feed side goes down, the wafer can be transferred in a state that it is made to stand straight on the supporting pins of the reception side, forces acting on the pins can be only an empty-weight of the wafer, and particle generation due to the contacts of the pins and a wafer edge can be reduced. |
