| 摘要 |
PROBLEM TO BE SOLVED: To form a pattern stably by preventing the distortion of a metal mask even if the metal mask is expanded due to heat at the time of film formation. SOLUTION: A pattern formation apparatus for forming a pattern on a substrate comprises a mask made of a magnetic material which is disposed on one face of the substrate, mask installation member to install the mask on, magnetized member disposed on the opposite face of the substrate, and pattern forming means disposed face to face with one face of the substrate whereon the mask is disposed. The mask installation member is provided with a recessed part which is larger in size than the mask when the mask has a thermal expansion and deeper than the thickness of the mask. The mask is installed in the recessed part.
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