| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a simulation method of fine work which can cope with problems, where computation load is large, memory capacity is enormous, re- computation load with respect to simulation condition partial change is large, etc., in electron beam lithography simulation. SOLUTION: To all divided computation regions, into which a simulation region is divided, (a) a real computation region setting process, where an object region is included and the peripheral part, is enlarged outside by L, (b) an object figure region setting process where the object region is included and the peripheral part is enlarged outside as much as M (M>L), (c) an object figure selecting process where all closed figures are selected from two-dimensional image drawing data, (d) a predicted shape constructing process where prescribed shape simulation is performed, on the basis of a prescribed process condition and a prediction shape is constructed, and (e) a trimming process where a peripheral region outside the divided computation region is eliminated from the prediction shape are executed. All predicted shapes, which are obtained according to the respective divided computation regions are arranged at corresponding positions, and the overall prediction shape is constructed.</p> |
