发明名称 PLASMA TREATMENT DEVICE AND PLASMA LIGHTING METHOD
摘要 PROBLEM TO BE SOLVED: To provide an inexpensive plasma treatment device capable of turning on the plasma certainly and making the starting operation in good performance. SOLUTION: The plasma treatment device according to the present invention is structured so that under a pressure in the vicinity of the atmospheric pressure, a high-frequency discharge plasma is generated in a reaction vessel 2 whose one side is left open as a blowout hole 1, and the generated plasma is allowed to blow in jet form out of the blowout hole 1 in the reaction vessel 2, and is equipped with an igniting means 5 to turn on the plasma, whereby the plasma can be turned on in such a way that no high voltage is impressed to an impedance matching circuit.
申请公布号 JP2002008894(A) 申请公布日期 2002.01.11
申请号 JP20000193415 申请日期 2000.06.27
申请人 MATSUSHITA ELECTRIC WORKS LTD 发明人 TAGUCHI NORIYUKI;SAWADA KOJI;YAMAZAKI KEIICHI;NAKAZONO YOSHIYUKI;INOOKA YUKIKO
分类号 H05H1/24;C23C16/513;H01L21/302;H01L21/3065;H05H1/34 主分类号 H05H1/24
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