| 摘要 |
PROBLEM TO BE SOLVED: To provide an ion implantation device and a replacement method of its source head which can reduce working hours to put a source head back into the usable state after replacement. SOLUTION: The replacement method of the source head for the ion implantation device includes a step for preparing a source head for replacement equipped with a slit 2 furnished in an arc chamber 1, a lid part 7 for closing up the slit 2, and a filament 3 arranged inside the arc chamber, a step for having filament 3 emit an out-gas and at the same time empty-baking the filament 3 by closing up the slit 2 of the arc chamber 1 with the lid part 7, vacuuming the inside of the arc chamber 1 and conducting the filament 3, and a step for changing a source head of an ion generating source with a replacement source head.
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