REFERENCE PLATE, ALIGNER, DEVICE MANUFACTURING SYSTEM, DEVICE MANUFACTURING METHOD, SEMICONDUCTOR MANUFACTURING PLANT AND MAINTENANCE METHOD OF THE ALIGNER

摘要

PROBLEM TO BE SOLVED: To provide a reference plate, capable of accurate and stable detection of marks, even with short wavelength observational light. SOLUTION: The reference plate for irradiating the observational light to a reference mark pattern, detecting the light reflected by it, and obtaining the position of the reference mark pattern is set to a place, where the reference mark pattern is not exposed directly to the observational light.