发明名称 DICING FILM FOR SEMICONDUCTOR WAFER
摘要 PROBLEM TO BE SOLVED: To provide a film which can be used ideally as a dicing film for semiconductor wafer which is used at the time of dicing a semiconductor wafer and is made of a material containing no chlorine. SOLUTION: This dicing film is composed of a resin substantially containing no chlorine and has at least one mixed-resin layer containing (A) 20-80 wt.% propylene-based resin, (B) 10-50% copolymer of an aromatic vinyl compound and conjugated diene or its hydrogenated derivative resin, and (C) 0-40 wt.% petroleum resin, terpene resin, coumarone-indene resin, rosin-based resin, or their hydrogenated derivatives.
申请公布号 JP2002009018(A) 申请公布日期 2002.01.11
申请号 JP20000183501 申请日期 2000.06.19
申请人 MITSUBISHI PLASTICS IND LTD 发明人 SASAKI HIDEKI;TAKAGI JUN
分类号 C08J5/18;C08L9/06;C08L23/10;C08L101/00;C09J7/02;C09J123/14;C09J151/02;H01L21/301;(IPC1-7):H01L21/301 主分类号 C08J5/18
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