| 摘要 |
PURPOSE: A method for forming a fine pattern of a semiconductor device is provided to form a smaller fine pattern and to improve a process margin and reliability, by realizing more powerful oblique angle illumination in a specific direction. CONSTITUTION: An x-axis optical width control apparatus and a y-axis optical width control apparatus(30) are disposed on the same axis in a longitudinal direction. The interval between upper and lower optical width control units(27,29) separated to the upper and lower portions of the respective optical width control units is controlled, or the optical width control units are rotated with the central axis of the optical axis control units as a center. Therefore, the optical width of light emitted from an original optical source(5) is controlled in x-axis and y-axis directions to embody the oblique angle illumination regarding an arbitrary pattern having a pattern in a specific direction.
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