发明名称 |
METHOD FOR APPLYING A TEXTURED INSULATION LAYER TO A METAL LAYER |
摘要 |
The invention relates to a method for applying a textured insulation layer (14) to a metal layer (12). According to said method, an insulation material (14) is applied to the metal layer (12), a covering material (16) is applied to the insulation layer (14) and the insulation material (14) and the covering material (16) are etched in a plasma etch process. The covering material (16) is textured following the application of the insulation layer (14) and a plasma etch process is carried out after said structuring of the covering material (16), to produce a textured and planarized insulation layer (14). |
申请公布号 |
WO0203453(A1) |
申请公布日期 |
2002.01.10 |
申请号 |
WO2001DE01956 |
申请日期 |
2001.05.22 |
申请人 |
ROBERT BOSCH GMBH;JARAK, SILVA |
发明人 |
JARAK, SILVA |
分类号 |
H01L21/3065;H01L21/3205;H01L21/768 |
主分类号 |
H01L21/3065 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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