发明名称 METHOD FOR APPLYING A TEXTURED INSULATION LAYER TO A METAL LAYER
摘要 The invention relates to a method for applying a textured insulation layer (14) to a metal layer (12). According to said method, an insulation material (14) is applied to the metal layer (12), a covering material (16) is applied to the insulation layer (14) and the insulation material (14) and the covering material (16) are etched in a plasma etch process. The covering material (16) is textured following the application of the insulation layer (14) and a plasma etch process is carried out after said structuring of the covering material (16), to produce a textured and planarized insulation layer (14).
申请公布号 WO0203453(A1) 申请公布日期 2002.01.10
申请号 WO2001DE01956 申请日期 2001.05.22
申请人 ROBERT BOSCH GMBH;JARAK, SILVA 发明人 JARAK, SILVA
分类号 H01L21/3065;H01L21/3205;H01L21/768 主分类号 H01L21/3065
代理机构 代理人
主权项
地址