| 摘要 |
<p>Compositions useful for removing photoresist from a surface that are less corrosive and do not cause skin irritation. Such compositions comprise an alkylene carbonate, and optionally, either an alcohol, glycol ether, or a dibasic ester. The compositions may also further include water or hydrogen peroxide. Additionally, a method of removing photoresist from a surface. The method involves contacting the surface with an effective amount of a composition that comprises: an alkylene carbonate; optionally, either an alcohol, glycol ether, or a dibasic ester; and, optionally, water or hydrogen peroxide, and allowing the composition to contact the surface for a period of time and under conditions effective to cause the removal of the photoresist from the surface.</p> |
