发明名称 TRANSISTOR AND MANUFACTURING METHOD THEREOF
摘要 PURPOSE: A transistor is provided to reduce a junction leakage current and to increase retention time, by forming a conductive layer electrically connected to a source/drain region on an isolation oxide layer adjacent to the source/drain region. CONSTITUTION: An isolation layer(32) is formed in an isolation region of a substrate(31), having the conductive layer(34) adjacent to an active region. A gate electrode(36) is formed on the substrate by interposing a gate insulation layer. The transistor is formed in the surface of the substrate at both sides of the gate electrode, including the source/drain region(37) electrically connected to the conductive layer.
申请公布号 KR20020002706(A) 申请公布日期 2002.01.10
申请号 KR20000036958 申请日期 2000.06.30
申请人 HYNIX SEMICONDUCTOR INC. 发明人 JUNG, HYEOK JE
分类号 H01L21/8232;(IPC1-7):H01L21/823 主分类号 H01L21/8232
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