CHEMICAL AMPLIFICATION TYPE RESIST COMPOSITION

摘要

PURPOSE: To provide a resist composition excellent in transmittance to light of <= 170 nm wavelength and suitable particularly for F2 excimer laser lithography. CONSTITUTION: The chemical amplification type resist composition contains a resin binder and a radiation sensitive compound. The resin binder is alkali- soluble or causes a chemical change under the action of the radiation sensitive compound after irradiation and becomes alkali-soluble and has a polymerization unit of formula (I) (where R1 is a 1-12C fluoroalkyl having at least one F atom and R2 is H or a 2-5C acyl).