发明名称 Nonvolatile semiconductor memory
摘要 A drain-side select gate line is set to VSG1 (>VDD) capable of sufficiently transferring VDD (time t1). Since all word lines in the selected block are set to Vread, VDD is applied to the channels of all memory cells in the cell units. After this, the drain-side select gate line is set to VSG2, and a program potential Vpgm is applied to the selected word line (times t2 to t3). Since VSG2 is sufficiently low, all drain-side select gate transistors are kept off, and the channel potentials of memory cells in all cell units are boosted. After this, since the drain-side select gate line is set to VSG3, the channel of the selected memory cell is set to 0V (time t4).
申请公布号 US2002003722(A1) 申请公布日期 2002.01.10
申请号 US20010860613 申请日期 2001.05.21
申请人 KANDA KAZUSHIGE;NAKAMURA HIROSHI;HOSONO KOJI;IKEHASHI TAMIO;IMAMIYA KENICHI 发明人 KANDA KAZUSHIGE;NAKAMURA HIROSHI;HOSONO KOJI;IKEHASHI TAMIO;IMAMIYA KENICHI
分类号 G11C16/02;G11C16/04;G11C16/10;(IPC1-7):G11C16/04 主分类号 G11C16/02
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