发明名称 Semiconductor device and method for fabricating the same
摘要 To provide a semiconductor device which can retain information for a long period of time even in a case that the tunnel insulation film is thin. A semiconductor device comprises a first insulation film 14 formed on a semiconductor substrate 10, a floating gate electrode 22 formed on the first insulation film, a second insulation 24 film formed on the floating gate electrode, and a control gate electrode 26 formed on the second insulation film. A depletion layer is formed in the floating gate electrode near the first insulation film in a state that no voltage is applied between the floating gate electrode and the semiconductor substrate.
申请公布号 US2002003255(A1) 申请公布日期 2002.01.10
申请号 US20010814000 申请日期 2001.03.22
申请人 FUJITSU LIMITED 发明人 USUKI TATSUYA;HORIGUCHI NAOTO
分类号 H01L21/8247;H01L21/28;H01L21/336;H01L27/115;H01L29/423;H01L29/788;H01L29/792;(IPC1-7):H01L29/788 主分类号 H01L21/8247
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