发明名称 |
PROCESS MEASURING TEMPERATURE OF LASER PLASMA |
摘要 |
physics of plasma. SUBSTANCE: invention is related to methods measuring electron temperature of plasma formed by laser radiation on targets made up of conductors. Plasma is formed under action of laser radiation on to surface of solid target installed in vacuum and electrons due to their high mobility escape from it. Peculiar plasma capacitor is formed as result on boundary of plasma with vacuum. In this case both plasma and target acquire at starting time moment certain potential V0 with reference to grounded walls of vacuum chamber. Thus target used as source of plasma functions simultaneously as sonde which does not introduce any disturbance into plasma. EFFECT: reduced measurement time of electron temperature of laser plasma. 2 dwg
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申请公布号 |
RU2178156(C1) |
申请公布日期 |
2002.01.10 |
申请号 |
RU20000112481 |
申请日期 |
2000.05.18 |
申请人 |
INSTITUT (TEKHNICHESKIJ UNIVERSITET);INST TEKHN UNI |
发明人 |
BYKOVSKIJ JU.A.;KONJUKHOV I.JU.;PEKLENKOV V.D. |
分类号 |
G01J5/50;(IPC1-7):G01J5/50 |
主分类号 |
G01J5/50 |
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