| 摘要 |
The invention relates to a method for applying a textured insulation layer (14) to a metal layer (12). According to said method, an insulation material (14) is applied to the metal layer (12), a covering material (16) is applied to the insulation layer (14) and the insulation material (14) and the covering material (16) are etched in a plasma etch process. The covering material (16) is textured following the application of the insulation layer (14) and a plasma etch process is carried out after said structuring of the covering material (16), to produce a textured and planarized insulation layer (14).
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