| 摘要 |
PURPOSE: A CVD system is provided to heighten the consistency of plasma, maintain high yield of products, consistently and continuously operable, and enable the film deposition having uniform film thickness and film quality over a large area in which the inside of a vacuum vessel is demarcated into a plasma generation space and a film deposition space. CONSTITUTION: A through holes(25) in the electrically conductive barrier rib part(14) are formed so that the hole diameter on the film deposition space(16) side is equivalent to or larger than the hole diameter on the plasma generation space(15) side. The through holes(25) are made of a structural body(30) independent from the electrically conductive barrier rib part(14).
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