ION GENERATOR USED IN PROCESS FOR MANUFACTURING SEMICONDUCTOR

摘要

PURPOSE: An ion generator used in a process for manufacturing a semiconductor is provided to prevent sputtered molecules from being evaporated on a filament and to extend a lifetime of the filament, by preventing sputtering generated in a repeller. CONSTITUTION: An arc chamber(110) has the first and second side surfaces facing each other. The filament(120) penetrates the first side surface of the arc chamber. A cathode plate(140) fixes an end of the filament. A nonpolar repeller(150) penetrates the second side surface of the arc chamber. Thermal electrons or ions generated from the filament are prevented from directly colliding against the inner surface of the arc chamber.