发明名称 APPARATUS AND METHOD FOR INSPECTION OF IMPURITY CONCENTRATION OF SEMICONDUCTOR
摘要 PURPOSE: To provide an impurity-concentration inspecting apparatus with which the impurity concentration of the whole of a semiconductor material as an object to be measured is measured and inspected simply, and with which the state of an impurity distribution is reproduced. CONSTITUTION: The impurity-concentration inspection apparatus for a semiconductor is constituted to be provided with a teraHertz pulse light source by which the semiconductor material is irradiated with the terahertz pulse light, a light-detecting means with which the transmitted pulsed light from the semiconductor material is detected, a terahertz-time-region measuring means which obtains a spectral transmission factor from the time-series waveform of the electric field strength of the transmitted pulsed light and a computing means, which calculates the impurity concentration of the semiconductor material on the basis of the spectral transmission factor.
申请公布号 KR20020002214(A) 申请公布日期 2002.01.09
申请号 KR20010034086 申请日期 2001.06.16
申请人 NIKON CORPORATION;TOCHIGI NIKON CORPORATION 发明人 FUKASAWA RYOICHI
分类号 G01N21/17;G01N21/00;G01N21/35;G01N21/3563;G01N21/3586;H01L21/66;(IPC1-7):G01N21/17 主分类号 G01N21/17
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