发明名称 DEFECT INSPECTING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a defect inspecting apparatus which can detect defects such as those in the same color system and in light color, that could not be detected easily so far. SOLUTION: In the detection of defects using a pattern match system, a surface examination is made for R, B and G components respectively at an R comparison part, a B comparison part and a G comparison part and simultaneously, conducted at a gray comparison part for a gray contrast combining the R, B and G components. In the surface examination, the examination images and the reference images are averaged individually, based on 3×3 pixels centered around a pixel to be noticed, and the results are mutually compared. When the difference in density is larger than the set threshold, it is judged that the examination pixels do not match with the corresponding reference pixels, and the examination pixels inspected are judged as defective pixels.
申请公布号 JP2002005846(A) 申请公布日期 2002.01.09
申请号 JP20000185187 申请日期 2000.06.20
申请人 TOKIMEC INC 发明人 HORINOUCHI SHINICHI;OMURO MASASHI;TANAKA MIKIYA;DOU MICHIHISA
分类号 G01B11/30;G01N21/898;G06T1/00 主分类号 G01B11/30
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