发明名称 AUTOMATIC CONTROLLER OF SPRAY PRESSURE OF ETCHING LIQUID WITH IMAGE SYSTEM
摘要 PURPOSE: An apparatus for automatically controlling a spray pressure of etching liquid with an image system is provided to control the rate and quantity of etching liquid sprayed to the surface of a material. CONSTITUTION: An image system takes a picture of the surface of a material(8) from which photoresist is eliminated, and acquires digitalized image data. A proportional control valve(2) is so installed in a pipe connecting an etching cell(6) with an etching liquid tank(7) that the proportional control valve controls the rate and quantity of etching liquid sprayed from an etching liquid spraying nozzle supplied to the pipe up to the surface of the material. A control unit(15) compares a width value of a line and space of the material with a previously-inputted permissible value through image data acquired by the image system to uniformly etch the material and control switch-on/off of the proportional control valve. The control unit is electrically connected to the image system and the proportional control valve, respectively.
申请公布号 KR20020001973(A) 申请公布日期 2002.01.09
申请号 KR20000036314 申请日期 2000.06.29
申请人 ACQUTEK SEMICONDUCTOR & TECHNOLOGY CO., LTD. 发明人 CHO, GEUN CHANG;HWANG, GIL NAM
分类号 H01L21/306;(IPC1-7):H01L21/306 主分类号 H01L21/306
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