摘要 |
<p>In an ion implantation apparatus, a control unit first controls a wafer transfer robot to mount wafers on surfaces of wafer holders, and then controls a driving motor to open an open/close mechanism. Subsequently, ion implantation is carried out, and then, the driving motor is controlled to close the open/close mechanism, and the wafer transfer robot is controlled to remove the wafers from the respective wafer holders. Accordingly, since an ion beam from an ion beam generating section is blocked by the open/close mechanism, there does not occur such a state that the ion beam is implanted into a beam stop in a target chamber to produce particles. <IMAGE></p> |