发明名称 |
POLYIMIDESILICONE RESIN, METHOD FOR PRODUCING THE SAME AND COMPOSITION THEREOF |
摘要 |
<p>PURPOSE: To provide a polyimidesilicone resin containing cyclic siloxane oligomers causing electric contact point troubles in a reduced content, to provide a method for producing the polyimidesilicone resin, and to provide a polyimidesilicone resin composition which contains the polyimidesilicone resin as an active component and exhibits high adhesivity and high reliability to substrates. CONSTITUTION: This polyimidesilicone resin characterized by containing cyclic siloxane oligomers having ten or less silicon atoms in an amount of <= 300 ppm, having a glass transition point of <= 250°C and being soluble in organic solvents. The polyimidesilicone resin is produced from a diaminosiloxane having a cyclic siloxane oligomer content of <= 300 ppm. The polyimidesilicone resin composition comprising 50 to 99 wt.% of the polyimidesilicone resin and 1 to 50 wt.% of an epoxy compound.</p> |
申请公布号 |
KR20020002269(A) |
申请公布日期 |
2002.01.09 |
申请号 |
KR20010037493 |
申请日期 |
2001.06.28 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
KATO HIDETO;SUGO MICHIHIRO |
分类号 |
C08L63/00;C08G73/10;C08G77/455;C08L79/08;C08L83/10;C09D179/08;C09J179/08;(IPC1-7):C08G73/10 |
主分类号 |
C08L63/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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