PHOTOSENSITIVE RESIN COMPOSITION, LAYER OF PHOTOSENSITIVE RESIN COMPOSITION USING THE SAME AND METHOD FOR PRODUCING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a photosensitive resin composition forming a tack-free surface in the unexposed state, suitable for contact exposure and excellent in photo-curability and alkali developability and to provide a method for producing a resist pattern using the composition. SOLUTION: The photosensitive resin composition contains an aqueous dispersion of a polyurethane oligomer (A) having an anionic hydrophilic group and an ethylenically unsaturated group in one molecule and an aqueous dispersion of a resin (B) having carboxyl groups. A layer of a photosensitive resin composition formed by applying and prebaking the above photosensitive resin composition on a substrate has a tack-free surface in the unexposed state. In the method for producing a resist pattern, the layer is formed on the substrate and imagewise irradiated with active light, the exposed part is photo-cured and the unexposed part is removed by development.