发明名称 AMORPHOUS FINE SILICA PARTICLE, ITS PRODUCTION METHOD AND ITS USE
摘要 <p>PROBLEM TO BE SOLVED: To provide a fine silica particle suitable as the filling material of a resin for semiconductor, and provide its production method. SOLUTION: In the method for producing an amorphous fine silica particle by introducing a gaseous silicone compound into a flame and hydrolyzing it, the flame temperature is made to be above the melting point of silica, a silica concentration in the flame is heightened, and a generated silica particle is stayed in the flame to be grown to obtain the amorphous silica particle having a mean particle diameter of 0.1-1.0μm and a specific surface area of 5-30 m2/g.</p>
申请公布号 JP2002003213(A) 申请公布日期 2002.01.09
申请号 JP20000184160 申请日期 2000.06.20
申请人 NIPPON AEROSIL CO LTD 发明人 SHIBAZAKI TAKEYOSHI;HONDA KAZUYOSHI
分类号 G03G9/08;C01B33/18;C08K3/36;C08L101/00;G03G5/05;G03G5/147;(IPC1-7):C01B33/18 主分类号 G03G9/08
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