摘要 |
<p>PROBLEM TO BE SOLVED: To provide a fine silica particle suitable as the filling material of a resin for semiconductor, and provide its production method. SOLUTION: In the method for producing an amorphous fine silica particle by introducing a gaseous silicone compound into a flame and hydrolyzing it, the flame temperature is made to be above the melting point of silica, a silica concentration in the flame is heightened, and a generated silica particle is stayed in the flame to be grown to obtain the amorphous silica particle having a mean particle diameter of 0.1-1.0μm and a specific surface area of 5-30 m2/g.</p> |