| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for effectively cleaning a film deposition system for an electrophotographic photoreceptor, by which adsorbed substances causing defects, such as particles and abnormal growth, can be removed from the inside of a reactor vessel after atmospheric relief and an electrophotographic photoreceptor having little defects can be obtained, and also to provide a film deposition method using the above cleaning method. SOLUTION: The method for cleaning the film deposition system for deposit film is a method for cleaning the film deposition system for forming the deposit film on a substrate in a reactor vessel under a pressure lower than the atmospheric pressure and has at least steps of: (1) removing the deposit film adhering to the inner wall of the reactor vessel; (2) subjecting the reactor vessel to atmospheric relief; and (3) cleaning the inner wall of the reactor vessel by means of cleaning gas containing at least ClF3 or plasma of the cleaning gas. Further, among these three steps, the step (3) is carried out finally.
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