METHOD FOR CLEANING RADIO FREQUENCY PLASMA CHAMBER

摘要

PURPOSE: A method for cleaning a radio frequency plasma chamber is provided to minimize time and cost necessary for a cleaning process not by removing a dome of the radio frequency plasma chamber and performing a cleaning process even after a predetermined number of wafers are used, but by cleaning a chamber through a simplified process. CONSTITUTION: A semiconductor wafer is mounted on an insulating support table(12) to form a metal interconnection on the wafer. The wafer is removed. A shutter(10) is mounted on the insulating support table. Negative radio frequency power is applied to a dome(60) to generate plasma inside a chamber(100).