发明名称 ARRAY SUBSTRATE FOR LCD AND MANUFACTURING METHOD THEREOF
摘要 PURPOSE: An array substrate for an LCD(Liquid Crystal Display) is provided to decrease the number of process steps and to shorten manufacturing time by manufacturing an array substrate with four masking processes and using a half tone mask in a third masking process of patterning a passivation layer. CONSTITUTION: A gate line, a gate electrode(101) and a gate pad are formed by a first masking process of depositing a first metal layer and patterning with a first mask. A data line(120) and a second storage electrode(120) are formed by a second masking process. A first insulating film, a gate insulating film, semiconductor layers and a second metal layer are deposited sequentially and patterned by a second mask. Thereby, a data line(120) having a data pad(124), a source electrode(112), a drain electrode(114) and a second storage electrode(120) are formed. The semiconductor layers are etched partially by using the second metal layer as a mask. The semiconductor layer except the lower part of the patterned second metal layer is etched to reduce leakage current. A passivation layer is patterned by a third mask. Herein, the third mask is used with a half tone mask having three kinds of exposure of photoresist. The passivation layer is patterned with slightly small width than one of the data line to cover a part of the data line and the source and drain electrodes. A pixel electrode is formed by a fourth masking process. Transparent conductive metal such as ITO(Indium Tin Oxide) and IZO(Indium Zinc Oxide) is deposited on a substrate having the patterned passivation layer and patterned by a fourth mask to form a pixel electrode(118). The pixel electrode contacted with a side by the exposed part of the drain electrode and with the second storage electrode through a storage contact hole.
申请公布号 KR20020000921(A) 申请公布日期 2002.01.09
申请号 KR20000034298 申请日期 2000.06.21
申请人 发明人
分类号 G02F1/136;G02F1/1362;G02F1/1368;(IPC1-7):G02F1/136 主分类号 G02F1/136
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