| 摘要 |
PROBLEM TO BE SOLVED: To provide a development processing device which is capable of preventing the excessive oxidation of a processing liquid. SOLUTION: This development processing device has a processing tank 41 for subjecting exposed photosensitive materials to development processing and an aeration device 9 for subjecting the processing liquid supplied into the processing tank 41 to oxidation processing. The aeration device 9 described above is constituted to be so controlled that the device is operated while the development processing of the photosensitive materials is performed and that the device is stopped while the development processing is not performed.
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