| 摘要 |
PROBLEM TO BE SOLVED: To perform high-precision film thickness control by using a film thickness control monitor and a characteristics monitor. SOLUTION: A dome 12 for holding a product substrate is formed above an evaporation source 11. Film thickness during film deposition is monitored by using a film thickness control monitor substrate 14 disposed at the central part of the dome, and film characteristics after film deposition are measured by using a characteristics monitor substrate 13. In order to reduce the error of film thickness control due to changes in refractive index during film deposition, the control wavelength of the film thickness monitor is corrected on the basis of the result of the measurement on the characteristics monitor substrate 13 and then film thickness control of the next layer is carried out.
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