| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an optical processing method and its device capable of forming a precise processing pattern even if a fixed position of a print mask material is dislocated on a table. SOLUTION: In an optical processing method forming a processing pattern on a print mask material 60, a plural of standard mask axes formed on the print material 60 fixed on a table 42 is acquired by irradiating an ultraviolet laser beam to the print mask material 60 fixed on the X-Y-θtable, and based on the standard mask axis, a dislocated position of a standard processing point and a gradient angle of the print mask material 60 are calculated, and based on the dislocated position of the standard processing point and the gradient angle, a processing position control data is adjusted from a design data of processing pattern. Based on the adjusted processing position control data, an irradiating position of ultraviolet laser beam to the print mask material is controlled.</p> |
