Process for manufacturing semiconductor devices

摘要

Manufactured is a semiconductor device that has a substrate and a surface channel nMOS and a buried channel nMOS as well as a surface channel pMOS and a buried channel pMOS formed on the substrate. An n+ dopant is introduced prior to pattering a polycrystalline semiconductor layer that forms respective gate electrodes of the surface channel nMOS and the buried channel pMOS. A p+ dopant is also introduced prior to pattering a polycrystalline semiconductor layer that forms respective gate electrodes of the surface channel pMOS and the buried channel nMOS.